Effect of Microstructure on Dielectric Breakdown in Amorphous HfO2 Films
نویسندگان
چکیده
1. Department of Electronic Materials Engineering, Research School of Physics and Engineering, The Australian National University, ACT-0200, Australia 2. Centre for Advanced Microscopy, The Australian National University, ACT-0200, Australia 3. Research School of Astronomy and Astrophysics, The Australian National University, ACT-0200, Australia 4. Department of Physics, The University of Chittagong, Chittagong-4331, Bangladesh
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